-
better wet the
surface of substrate,
photoresists are
required to
possess relatively low
surface tension.
Photoresists used in
production for DUV and shorter...
-
unique in the
sense it
allows for the use of
photoresists with
metal oxides.
After prebaking, the
photoresist is
exposed to a
pattern of
intense light. The...
- SU-8
series photoresists use gamma-butyrolactone or
cyclopentanone as the
primary solvent. SU-8 was
originally developed as a
photoresist for the microelectronics...
-
Negative photoresists are
composed of a poly(cis-isoprene) matrix,
xylene solvent, and bis-arylazide as the
photoactive compound.
Negative photoresists react...
- EUV- or electron-driven reactions.
Organic photoresists outgas hydrocarbons while metal oxide photoresists outgas water and
oxygen and
metal (in a hydrogen...
-
sulfonic acid
esters are
components of
common photoresist materials. Such
photoresists are used in the
manufacture of semiconductors. In this
application DNQs...
-
utilized in a
variety of wide-ranging
applications from
protein science to
photoresists. Due to the
large number of
reported protecting groups, PPGs are often...
-
photochemical reaction in the
polymer phase.
Photoresists can be
classified as
positive or negative. In
positive photoresists, the
photochemical reaction that occurs...
- manufacturing,
including equipment for thin film deposition,
plasma etch,
photoresist strip, and
wafer cleaning processes.
Throughout semiconductor manufacturing...
- (January 2006).
Chemical Information Review Do****ent for
Diazonaphthoquinone Derivatives Used in
Photoresists (PDF) (Report).
National Toxicology Program....
