- A
photoresist (also
known simply as a resist) is a light-sensitive
material used in
several processes, such as
photolithography and photoengraving, to...
- material,
called a
photoresist,
being applied to the substrate. A
photomask that
contains the
desired pattern is then
placed over the
photoresist.
Light is shone...
- SU-8 is a
commonly used epoxy-based
negative photoresist.
Negative refers to a
photoresist whereby the
parts exposed to UV
become cross-linked, while...
-
photomask in
direct contact with a
substrate coated with an
imaging photoresist layer. The
first integrated circuits had
features of 200 micrometres...
-
intensively in photolithography, to
deposit layers of
photoresist about 1
micrometre thick.
Photoresist is
typically spun at 20 to 80
revolutions per second...
-
process possible through the
combined use of
hexamethyldisilazane (HMDS),
photoresist (positive or negative), spin coating, photomask, an
exposure system and...
-
semiconductor manufacturing plasma ashing is the
process of
removing the
photoresist (light
sensitive coating) from an
etched wafer.
Using a
plasma source...
-
surface of a
substrate (e.g. wafer)
using a
sacrificial material (e.g.
photoresist). It is an
additive technique as
opposed to more
traditional subtracting...
- are
especially important in
microelectronics where they are used as
photoresist materials. They are also used as
tackifiers in rubber.
Phenol formaldehyde...
- with
photoresist. Ion
implantation is then completed, with ions of the
chosen dopant type
penetrating the gate
oxide in
areas where no
photoresist is present...
